Field Localization and Enhancement of Phase Locked Second and Third Harmonic Generation in Absorbing Semiconductor Cavities

TL;DR

This paper demonstrates significant enhancement of phase-locked second and third harmonic generation in GaAs cavities, overcoming absorption issues through phase locking and field localization, enabling efficient harmonic generation in the visible and UV ranges.

Contribution

It introduces a novel approach to enhance harmonic generation in absorbing semiconductors using phase locking and cavity field localization.

Findings

Achieved three orders of magnitude enhancement in harmonic generation

Observed effective absorption inhibition via phase locking

Demonstrated potential for semiconductor devices in visible and UV ranges

Abstract

We predict and experimentally observe the enhancement by three orders of magnitude of phase mismatched second and third harmonic generation in a GaAs cavity at 650nm and 433nm, respectively, well above the absorption edge. Phase locking between the pump and the harmonics changes the effective dispersion of the medium and inhibits absorption. Despite hostile conditions the harmonics become localized inside the cavity leading to relatively large conversion efficiencies. Field localization plays a pivotal role and ushers in a new class of semiconductor-based devices in the visible and UV ranges.