Benchmark of Rigorous Methods for Electromagnetic Field Simulations

TL;DR

This paper benchmarks electromagnetic field simulation methods for DUV masks, demonstrating convergence and accuracy across different solvers and complex mask patterns.

Contribution

It introduces an integrated interface for rigorous EMF simulations combining JCMsuite and Dr.LiTHO, enabling comprehensive benchmarking.

Findings

Demonstrates convergence of near-field and far-field results for various mask types

Benchmarks waveguide and finite-element-method EMF solvers, showing their relative performance

Validates simulation accuracy for complex 3D mask patterns

Abstract

We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO. With the combined tools we investigate the convergence of near-field and far-field results for different DUV masks. We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and with the finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolated hole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.