$T_1$- and $T_2$-spin relaxation time limitations of phosphorous donor electrons near crystalline silicon to silicon dioxide interface defects
S.-Y. Paik, S.-Y. Lee, W. J. Baker, D. R. McCamey. C. Boehme

TL;DR
This study investigates how interface defects near silicon dioxide affect the spin relaxation times of phosphorus donor electrons in silicon at cryogenic temperatures, revealing significant reductions in coherence and relaxation times.
Contribution
It provides new insights into the impact of specific interface defects on phosphorus donor spin dynamics using advanced pulsed magnetic resonance techniques.
Findings
Both T_1 and T_2 times are significantly reduced near interface defects at low temperatures.
Spin-dependent electronic transitions between phosphorus donors and interface states are confirmed.
Surface-sensitive measurements reveal the detrimental effect of interface states on donor spin coherence.
Abstract
A study of donor electron spins and spin--dependent electronic transitions involving phosphorous (P) atoms in proximity of the (111) oriented crystalline silicon (c-Si) to silicon dioxide (SiO) interface is presented for [P] = 10 and [P] = 10 at about liquid He temperatures ( ). Using pulsed electrically detected magnetic resonance (pEDMR), spin--dependent transitions between the \Phos donor state and two distinguishable interface states are observed, namely (i) \Pb centers which can be identified by their characteristic anisotropy and (ii) a more isotropic center which is attributed to E defects of the \sio bulk close to the interface. Correlation measurements of the dynamics of spin--dependent recombination confirm that previously proposed transitions…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
