Cryogenic instrumentation for fast current measurement in a silicon single electron transistor
T. Ferrus, D. G. Hasko, Q. R. Morrissey, S. R. Burge, E. J. Freeman,, M. J. French, A. Lam, L. Creswell, R. J. Collier, D. A. Williams, G. A. D., Briggs

TL;DR
This paper introduces a cryogenic high-bandwidth measurement system for silicon single-electron transistors, enabling faster quantum state observations and analyzing measurement impacts on electron heating and noise.
Contribution
It presents a novel cryogenic instrumentation approach that surpasses traditional methods in speed and efficiency for single-electron transistor measurements.
Findings
Successful implementation of single-shot quantum state measurement
Faster measurement capabilities at cryogenic temperatures
Analysis of electron heating and noise effects
Abstract
We present a realisation of high bandwidth instrumentation at cryogenic temperatures and for dilution refrigerator operation that possesses advantages over methods using radio-frequency single electron transistor or transimpedance amplifiers. The ability for the low temperature electronics to carry out faster measurements than with room temperature electronics is investigated by the use of a phosphorous-doped single-electron transistor. A single-shot technique is successfully implemented and used to observe the real time decay of a quantum state. A discussion on various measurement strategies is presented and the consequences on electron heating and noise are analysed.
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