Tuning of structure inversion asymmetry by the $\delta$-doping position in (001)-grown GaAs quantum wells
V. Lechner, L.E. Golub, P. Olbrich, S. Stachel, D. Schuh, W., Wegscheider, V.V. Bel'kov, and S.D. Ganichev

TL;DR
This study demonstrates that the structure inversion asymmetry in GaAs quantum wells can be precisely controlled by adjusting the delta-doping layer position, impacting the material's electronic properties.
Contribution
It introduces a method to tune the structure inversion asymmetry in GaAs quantum wells through delta-doping position, enabling better control of quantum well properties.
Findings
SIA can be tailored by delta-doping position.
Symmetrically-doped structures show impurity segregation-induced SIA.
Almost equal structure and bulk inversion asymmetry achieved.
Abstract
Structure and bulk inversion asymmetry in doped (001)-grown GaAs quantum wells is investigated by applying the magnetic field induced photogalvanic effect. We demonstrate that the structure inversion asymmetry (SIA) can be tailored by variation of the delta-doping layer position. Symmetrically-doped structures exhibit a substantial SIA due to impurity segregation during the growth process. Tuning the SIA by the delta-doping position we grow samples with almost equal degrees of structure and bulk inversion asymmetry.
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