A Hot Electron Thermocouple and the Diffusion Thermopower of Two-Dimensional Electrons in GaAs
W.E. Chickering, J.P. Eisenstein, and J.L. Reno

TL;DR
This paper introduces a simple hot electron thermocouple for measuring the diffusion thermopower of a 2D electron system in GaAs, providing results consistent with the Mott formula up to 2 K with less phonon-drag sensitivity.
Contribution
A novel hot electron thermocouple technique for 2DES thermopower measurement that avoids micron-scale patterning and reduces phonon-drag effects.
Findings
Thermopower results agree with Mott formula up to 2 K.
Technique is less sensitive to phonon-drag effects.
No micron-scale patterning required.
Abstract
A simple hot electron thermocouple is realized in a two-dimensional electron system (2DES) and used to measure the diffusion thermopower of the 2DES at zero magnetic field. This hot electron technique, which requires no micron-scale patterning of the 2DES, is much less sensitive than conventional methods to phonon-drag effects. Our thermopower results are in good agreement with the Mott formula for diffusion thermopower for temperatures up to T ~ 2 K.
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Taxonomy
TopicsAdvanced Thermodynamics and Statistical Mechanics · Advanced Thermoelectric Materials and Devices · Quantum, superfluid, helium dynamics
