Contacting individual Fe(110) dots in a single electron-beam lithography step

TL;DR

This paper introduces a novel electron-beam lithography method to locally contact individual Fe(110) nanostructures in a single fabrication step, enabling detailed magneto-transport studies of domain wall components.

Contribution

The work presents a new integrated lithography technique for contacting single nanostructures during fabrication, simplifying the process for magnetic domain analysis.

Findings

Successful contact of individual Fe(110) dots demonstrated

Control of magnetisation in Ne9el caps via external magnetic field

Preliminary magneto-transport measurements performed

Abstract

We report on a new approach, entirely based on electron-beam lithography technique, to contact electrically, in a four-probe scheme, single nanostructures obtained by self-assembly. In our procedure, nanostructures of interest are localised and contacted in the same fabrication step. This technique has been developed to study the field-induced reversal of an internal component of an asymmetric Bloch domain wall observed in elongated structures such as Fe(110) dots. We have focused on the control, using an external magnetic field, of the magnetisation orientation within N\'eel caps that terminate the domain wall at both interfaces. Preliminary magneto-transport measurements are discussed demonstrating that single Fe(110) dots have been contacted.