Investigation of thermal stability of hydrogenated amorphous Si/Ge multilayers
A. Csik, M. Serenyi, Z. Erdelyi, A. Nemcsics, C. Cserhati, G.A., Langer, D.L. Beke, C. Frigeri, A. Simon

TL;DR
This study investigates how hydrogen content affects the thermal stability of amorphous Si/Ge multilayers, revealing that higher hydrogen levels accelerate structural decay at elevated temperatures.
Contribution
It provides new insights into the relationship between hydrogen concentration and thermal stability in amorphous Si/Ge multilayers, using multiple microscopy and analysis techniques.
Findings
Higher hydrogen content leads to faster structural decay at high temperatures.
Hydrogen desorption causes bubble and crater formation during annealing.
Lower hydrogen levels slow down the decay of multilayer periodicity.
Abstract
Thermal stability of hydrogenated amorphous Si/Ge multilayers has been investigated by Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) and Small-Angle X-Ray Diffraction (SAXRD) techniques. Amorphous H-Si/Ge multilayers were prepared by RF sputtering with 1.5 and 6 ml/min H2 flow-rate. It is shown by Elastic Recoil Detection Analysis (ERDA) that the hydrogen concentration increased by increasing H2 flow-rate. Annealing of the samples was carried out at 400 and 450 oC for several hours. It has been observed that samples prepared with 6 ml/min flow-rate at both annealing temperatures underwent significant structural changes: the surface of the samples was visibly roughened, gas bubbles were formed and craters were created. The decay of the periodic structure of Si and Ge layers in these types of multilayers was faster than in non-hydrogenated samples. Samples…
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Taxonomy
TopicsThin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies
