Acetylene - Argon Plasmas Measured at a Biased Substrate Electrode for Diamond-Like Carbon Deposition. Part 2: Ion Energy Distributions
A. Baby, C. M. O. Mahony, P. Lemoine, P. D. Maguire

TL;DR
This study measures ion energy distributions in acetylene-argon plasmas at a biased electrode, revealing how pressure and bias conditions influence ion energies and film properties for diamond-like carbon deposition.
Contribution
It provides detailed ion energy distribution data at a biased electrode in acetylene-argon plasmas, highlighting effects of pressure and bias frequency on ion energies and film hardness.
Findings
Ion energy distributions are bimodal at pressures up to 25 mTorr.
Dominant ions are Ar+ or ArH+ despite C2H2 presence.
Peak hardness of films occurs at around 90 eV ion energy.
Abstract
Ion energy distributions have been determined at the rf-bias electrode in an inductively-coupled acetylene-argon plasma for various substrate bias voltages and frequencies under conditions suitable for film deposition. These are compared with those obtained at the grounded wall of a capacitively coupled plasma. In the former, for pressures up to 25 mTorr, the IEDs exhibit bimodal structures with peak separation values that follow the expected dependence on voltage and frequency. At higher pressures, 120 mTorr, the bimodal structure is replaced by a single peak. For all conditions, the dominant ion is Ar+ or ArH+ despite a set C2H2:Ar flow ratio of 2:1, and this can be attributed to the high electron dissociation of the parent molecule. Diamond-like carbon films indicate a peak hardness at an ion energy of around 90 eV and a very sharp fall in hardness is noted beyond this value. This is…
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Taxonomy
TopicsDiamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · Ion-surface interactions and analysis
