Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2
D.A. Ariskin, I.V. Schweigert, A.L. Alexandrov, A. Bogaerts, F.M., Peeters

TL;DR
This paper presents a hybrid kinetic-fluid model to analyze the effects of adding acetylene to argon in low-pressure RF capacitive discharges, revealing significant changes in plasma properties and potential nanoparticle formation.
Contribution
A novel hybrid modeling approach combining kinetic and fluid descriptions for plasma and plasmochemical processes in Ar/C2H2 discharges.
Findings
Electronegativity of the mixture is about 30%.
Heavy hydrocarbon densities are sufficient for nanoparticle formation.
Injection of 5.8% acetylene significantly alters plasma parameters.
Abstract
We study the properties of a capacitive 13.56 MHz discharge properties with a mixture of Ar/C2H2 taking into account the plasmochemistry and growth of heavy hydrocarbons. A hybrid model was developed to combine the kinetic description for electron motion and the fluid approach for negative and positive ions transport and plasmochemical processes. A significant change of plasma parameters related to injection of 5.8% portion of acetylene in argon was observed and analyzed. We found that the electronegativity of the mixture is about 30%. The densities of negatively and positively charged heavy hydrocarbons are sufficiently large to be precursors for the formation of nanoparticles in the discharge volume.
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