Metallic Pattern Fabrication in Organic Mott Insulating Crystal by Local X-Ray Irradiation

TL;DR

This study demonstrates a method to create metallic patterns in an organic Mott insulator using localized X-ray irradiation, enabling potential applications in molecular electronics without damaging the material.

Contribution

We developed a technique to fabricate metallic structures in an organic Mott insulator via localized X-ray irradiation, preserving material integrity.

Findings

Metallic domains of ~90x90 μm² were successfully created.

No deterioration observed at nanometer to micrometer scales.

Method applicable for molecular electronic device fabrication.

Abstract

We have fabricated a metallic structure in an organic Mott insulator $\kappa$-(BEDT-TTF)$_2$Cu[N(CN)$_2$]Cl. The periodic metallic domains of approximately 90$\times$90 $\mu$m$^2$ obtained by X-ray irradiation through a molybdenum mesh mask are visualized by scanning microregion infrared reflectance spectroscopy technique. No deterioration by irradiation is found in a range of nanometer to micrometer scales. We demonstrate that the present processing method is applicable for the fabrication of molecular electronic devices.