Controlled light-matter coupling for a single quantum dot embedded in a pillar microcavity using far-field optical lithography
A. Dousse, L. Lanco, J. Suffczynski, E. Semenova, A. Miard, A., Lemaitre, I. Sagnes, C. Roblin, J. Bloch, P. Senellart

TL;DR
This paper demonstrates a method to precisely position a single quantum dot within a microcavity using far-field optical lithography at cryogenic temperatures, enabling deterministic light-matter coupling and quantum dot coupling to the same optical mode.
Contribution
It introduces an in-situ lithography technique that achieves spectral and spatial matching of quantum dots and microcavities with high accuracy, advancing quantum photonics.
Findings
Achieved 50 nm positioning accuracy of quantum dots within microcavities.
Observed strong Purcell effect indicating enhanced light-matter interaction.
Demonstrated deterministic coupling of two quantum dots to a single optical mode.
Abstract
Using far field optical lithography, a single quantum dot is positioned within a pillar microcavity with a 50 nm accuracy. The lithography is performed in-situ at 10 K while measuring the quantum dot emission. Deterministic spectral and spatial matching of the cavity-dot system is achieved in a single step process and evidenced by the observation of strong Purcell effect. Deterministic coupling of two quantum dots to the same optical mode is achieved, a milestone for quantum computing.
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