New high fill-factor triangular micro-lens array fabrication method using UV proximity printing
T.-H. Lin, H. Yang, C.-K. Chao

TL;DR
This paper presents a novel UV proximity printing method for fabricating high fill-factor triangular micro-lens arrays with precise geometric control, enhancing backlight luminance in LCDs.
Contribution
The study introduces a simple, effective lithography-based technique utilizing UV proximity printing to produce high fill-factor triangular microlens arrays with controlled profiles.
Findings
Triangular microlens arrays can be fabricated with gaps from 240 to 840 micrometers.
The method achieves automatic formation of the array.
Potential application in increasing LCD backlight luminance.
Abstract
A simple and effective method to fabricate a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling a printing gap between the mask and substrate. The designed approximate triangle microlens array pattern can be fabricated the high fill-factor triangular microlens array in photoresist. It is due to the UV light diffraction to deflect away from the aperture edges and produce a certain exposure in photoresist material outside the aperture edges. This method can precisely control the geometric profile of high fill factor triangular microlens array. The experimental results showed that the triangular micro-lens array in photoresist could be formed automatically when the printing gap ranged from 240 micrometers to 840 micrometers. The gapless triangular microlens array will…
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