Electron Optic Design of Arrayed E-Beam Microcolumns Based Systems for Wafer Defects Inspection
V.V. Kazmiruk, T.N. Savitskaja
TL;DR
This paper discusses the design of electron optic systems for arrayed e-beam microcolumns aimed at wafer defect inspection, proposing a practical realization as a next-generation alternative to light optics and single e-beam systems.
Contribution
It introduces a novel electron optic design for arrayed e-beam microcolumns to improve wafer defect inspection capabilities.
Findings
Proposed electron optic system suitable for wafer defect inspection
Potential to replace light optics in next-generation systems
Enhanced efficiency of defect detection
Abstract
In this paper is considered a matter of the system for wafer defect inspection (WDIS) practical realization. Such systems are on the agenda as the next generation and substitution for light optics and single -beam based WDISs.
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Taxonomy
TopicsIntegrated Circuits and Semiconductor Failure Analysis · Electron and X-Ray Spectroscopy Techniques · Advancements in Photolithography Techniques