Coupled-Resonator Optical Near-Field Lithography

TL;DR

This paper investigates pattern formation in near-field lithography using planar resonators, demonstrating how coupled resonator arrays can enhance spatial bandwidth and produce sub-diffraction-limited features.

Contribution

It introduces the concept of using coupled planar resonators to increase the spatial bandwidth of resonant enhancement in near-field lithography.

Findings

Sub-diffraction-limited spots can be generated using planar resonators.

Coupled resonator arrays create a band of Bloch resonances, enhancing pattern control.

The approach leverages rotational invariance for pattern formation.

Abstract

The problem of pattern formation in resonantly-enhanced near-field lithography by the use of dielectric or plasmonic planar resonators is investigated. Sub-diffraction-limited bright or dark spots can be produced by taking advantage of the rotational invariance of planar resonators. To increase the spatial bandwidth of the resonant enhancement, an array of coupled planar resonators can open up a band of Bloch resonances, analogous to coupled-resonator optical waveguides.