Quantum modulation of the Kondo resonance of Co adatoms on Cu/Co/Cu(100)
Takashi Uchihashi, Jianwei Zhang, Joerg Kroeger, and Richard Berndt

TL;DR
This study demonstrates how quantum well states in Cu films modulate the Kondo temperature of Co adatoms, revealing a link between quantum confinement and magnetic impurity behavior.
Contribution
It provides a quantitative model connecting quantum well states to the variation of the Kondo temperature in a multilayer system.
Findings
Kondo temperature varies with Cu film thickness from 60 K to 134 K.
Quantum well states influence the density of states at the Fermi level.
Model reproduces key features of T_K variation based on quantum oscillations.
Abstract
Low-temperature scanning tunneling spectroscopy reveals that the Kondo temperature T_K of Co atoms adsorbed on Cu/Co/Cu(100) multilayers varies between 60 K and 134 K as the Cu film thickness decreases from 20 to 5 atomic layers. The observed change of T_K is attributed to a variation of the density of states at the Fermi level \rho_F induced by quantum well states confined to the Cu film. A model calculation based on the quantum oscillations of \rho_F at the belly and the neck of the Cu Fermi surface reproduces most of the features in the measured variation of T_K.
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Taxonomy
TopicsQuantum and electron transport phenomena · Advanced Physical and Chemical Molecular Interactions · Magnetic properties of thin films
