Nanomachining of mesoscopic graphite
P. Barthold, T. Luedtke, R. J. Haug

TL;DR
This paper demonstrates nanomachining of multilayer graphene using an atomic force microscope, revealing reversible electrical resistance changes due to dislocation movement and permanent modifications after repeated attempts.
Contribution
It introduces a method for nanomachining mesoscopic graphite and investigates the electrical behavior during the process, highlighting dislocation dynamics.
Findings
Reversible resistance changes linked to dislocation movement
Permanent structural modifications after multiple nanomachining attempts
In-situ resistance measurement during nanostructuring
Abstract
An atomic force microscope is used to structure a film of multilayer graphene. The resistance of the sample was measured in-situ during nanomachining narrow trenches. We found a reversible behavior in the electrical resistance which we attribute to the movement of dislocations. After several attempts also permanent changes are observed.
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Taxonomy
TopicsGraphene research and applications
