Recent advances in pulsed-laser deposition of complex-oxides

TL;DR

This paper reviews recent modifications and kinetic insights into pulsed-laser deposition (PLD) for complex oxides, highlighting how non-thermal processes influence growth and interface sharpness.

Contribution

It provides a comprehensive review of PLD process modifications and presents new experimental evidence on growth kinetics and non-thermal effects in oxide film formation.

Findings

True layer-by-layer growth is approached but not fully achieved.

Non-thermal processes dominate during key growth stages.

Kinetic manipulation can improve interface sharpness.

Abstract

Pulsed-laser deposition (PLD) is one of the most promising techniques for the formation of complex-oxide heterostructures, superlattices, and well-controlled interfaces. The first part of this paper presents a review of several useful modifications of the process, including methods inspired by combinatorial approaches. We then discuss detailed growth kinetics results, which illustrate that 'true' layer-by-layer (LBL) growth can only be approached, but not fully met, even though many characterization techniques reveal interfaces with unexpected sharpness. Time-resolved surface x-ray diffraction measurements show that crystallization and the majority of interlayer mass transport occur on time scales that are comparable to those of the plume/substrate interaction, providing direct experimental evidence that a growth regime exists in which non-thermal processes dominate PLD. This understanding shows how kinetic growth manipulation can bring PLD closer to ideal LBL than any other growth method available today.