Fabrication and Characterization of Large Area Metallic Nano-Split-Ring Arrays by Nanoimprint Lithography

TL;DR

This paper introduces a new, cost-effective nanoimprint lithography method for fabricating large-area metallic nano-split-ring arrays, enabling practical applications by demonstrating their optical magnetic response.

Contribution

It presents the first scalable, high-throughput process for creating dense metallic nano-split-ring arrays with measurable optical magnetic properties.

Findings

Achieved wafer-scale fabrication of nano-split-ring arrays

Demonstrated magnetic response with 10dB extinction ratio

Enabled large feature size to relax lithography resolution constraints

Abstract

This paper presents a novel method to parallel fabricate large area (wafer scale) metallic nano-split-ring arrays with nanoimprint lithography (NIL). To our knowledge it is the first method that can pattern large area and high dense metallic split-ring arrays with advantages of high throughput, low-cost and simplicity. This method makes metallic nano-split-ring arrays, which was somehow conceptual before, practically useful. The optical properties of the fabricated gold nano-split-ring arrays with different parameters were measured. They show very obvious magnetic response to the incident light (which shows 10dB extinction ration in transmission spectra). The structure fabricated by this method can generate magnetic response in optical range with relatively large feature size that relax the requirement of resolution on lithography.