Anisotropy driven ultrafast nanocluster burrowing
P. S\"ule

TL;DR
This study investigates ultrafast, anisotropy-driven nanocluster burrowing into substrates at low energies, revealing a ballistic penetration mechanism that surpasses traditional collisional explanations, with implications for nanomaterial engineering.
Contribution
It uncovers a novel, anisotropy-dependent burrowing mechanism for nanoclusters at low impact energies, supported by molecular dynamics simulations across various material pairs.
Findings
Nanoclusters can penetrate substrates at impact energies as low as 0.5 eV/atom.
Cluster burrowing occurs with nearly constant speed, far beyond the impact energy range.
Asymmetry in burrowing behavior depends on cluster/substrate material pairing.
Abstract
We explore the occurrence of low-energy and low-temperature transient cluster burrowing leading to intact cluster inclusions. In particular, the anomalously fast (ballistic) Pt nanocluster implantation into Al and Ti substrates has been found by molecular dynamics simulations using a tight-binding many-body potential with the 1-5 eV/atom low impact energy. Similar behavior has also been found for many other cluster/substrate couples such as Cu/Al and Ni/Ti, Co/Ti, etc. In particular, in Ni/Ti at already eV/atom impact energy burrowing takes place. At this few eV/atom low impact energy regime instead of the expected stopping at the surface we find the propagation of the cluster through a thin Al slab as thick as with a nearly constant speed ( eV/atom). Hence the cluster moves far beyond the range of the impact energy which suggests that the…
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