Magnetic properties of HO2 thin films

TL;DR

This study investigates the magnetic and transport properties of hafnium oxide thin films grown under various oxygen pressures, revealing changes in conductivity but no intrinsic ferromagnetism across conditions.

Contribution

It provides a comprehensive analysis of how oxygen pressure affects the physical and magnetic properties of HfO2 thin films, with a focus on their conductivity and magnetic signals.

Findings

Low oxygen pressure films are metallic and conductive.

Higher oxygen pressure films are insulating.

No intrinsic ferromagnetic signal detected in any films.

Abstract

We report on the magnetic and transport studies of hafnium oxide thin films grown by pulsed-laser deposition on sapphire substrates under different oxygen pressures, ranging from 10-7 to 10-1 mbar. Some physical properties of these thin films appear to depend on the oxygen pressure during growth: the film grown at low oxygen pressure (P ~= 10-7 mbar) has a metallic aspect and is conducting, with a positive Hall signal, while those grown under higher oxygen pressures (7 x 10-5 <= P <= 0.4 mbar) are insulating. However, no intrinsic ferromagnetic signal could be attributed to the HfO2 films, irrespective of the oxygen pressure during the deposition.