Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber
Yu.M.Gavriljuk (1), V.N.Gavrin (1), A.M.Gangapshev (1), V.V.Kazalov, (1), V.V.Kuzminov (1), S.I.Panasenko (2), S.S.Ratkevich (2) (1-Baksan, Neutrino Observatory INR RAS, Russia, 2-Karazin Kharkiv National University,, Ukraine)
TL;DR
This paper describes the development of an ion pulse ionization chamber designed to measure ultra-low surface alpha-activity levels in various samples, demonstrating its application with alpha sources, copper samples, and reflective films.
Contribution
It introduces a specialized ion pulse ionization chamber for precise surface alpha-activity measurement of diverse materials.
Findings
Successful measurement of alpha-activity in samples
Application to copper and reflective films
Demonstration of ultra-low detection capabilities
Abstract
The construction of an ion pulse ionization chamber aimed at measuring ultra-low levels of surface alpha-activity of different samples is described. The results of measurement carried out with alpha-source and copper samples and light-reflecting film VM2000 are presented.
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Taxonomy
TopicsNuclear Physics and Applications · Radioactive Decay and Measurement Techniques · Mass Spectrometry Techniques and Applications