Surface versus bulk characterization of the electronic inhomogeneity in a VO_{2} film
Y. J. Chang, J. S. Yang, Y. S. Kim, D. H. Kim, T. W. Noh, D.-W. Kim,, E. OH, B. Kahng, J.-S. Chung

TL;DR
This study compares surface and bulk electronic inhomogeneity in VO₂ thin films during the metal-insulator transition, revealing different behaviors likely due to strain effects near the surface, with implications for correlated electron systems.
Contribution
It provides a combined surface and bulk analysis of the MIT in VO₂ films, highlighting the role of strain in surface inhomogeneity and its impact on transition dynamics.
Findings
Bulk measurements fit percolation theory well
Surface inhomogeneity evolves more slowly than bulk
Strain near the surface influences the MIT behavior
Abstract
We investigated the inhomogeneous electronic properties at the surface and interior of VO_{2} thin films that exhibit a strong first-order metal-insulator transition (MIT). Using the crystal structural change that accompanies a VO_{2} MIT, we used bulk-sensitive X-ray diffraction (XRD) measurements to estimate the fraction of metallic volume p^{XRD} in our VO_{2} film. The temperature dependence of the p was very closely correlated with the dc conductivity near the MIT temperature, and fit the percolation theory predictions quite well: (p - p_{c})^{t} with t = 2.00.1 and p_{c} = 0.160.01. This agreement demonstrates that in our VO thin film, the MIT should occur during the percolation process. We also used surface-sensitive scanning tunneling spectroscopy (STS) to investigate the microscopic evolution of the MIT near the surface. Similar to the…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
