Morphological influence on surface--wave propagation at the planar interface of a metal film and a columnar thin film

TL;DR

This paper investigates how the vapor deposition angle affects surface-wave propagation at a metal-columnar thin film interface, revealing that higher angles lead to lower phase velocities and shorter propagation ranges, impacting excitation conditions.

Contribution

It demonstrates the influence of vapor deposition angle on surface-wave characteristics at metal-CTF interfaces, providing insights for optimizing wave excitation in optical applications.

Findings

Higher vapor deposition angles reduce phase velocity.

Increased angles shorten surface-wave propagation range.

Modified excitation conditions are required for higher angles.

Abstract

The selection of a higher vapor deposition angle when growing a columnar thin film (CTF) leads to surface-wave propagation at a planar metal-CTF interface with phase velocity of lower magnitude and shorter propagation range. Acordingly, a higher angle of plane-wave incidence is required to excite that surface wave in a modified Kretschmann configuration.